PROLITH
Advanced Lithography Optimization and OPC Application Tool
Computational Lithography -
The only source of expertly calibrated resist files for the latest photoresists, including immersion resists -
New PROLITH-based OPC (PBOPC) capability gives development teams the highest level of predictive accuracy for next-generation OPC development to meet production ramp schedules -
Enables “what if” exploration of the effects of processes, materials and tools on lithography results over a wide range of conditions including immersion lithography, double-patterning techniques, and EUV -
Determines the performance tradeoffs of the most advanced stepper and mask technologies -
Delivers lithography process optimization information in seconds, speeding process development Optimizes process windows quickly and cost effectively
Enter the Users Only Site
The Users Only site houses the PROLITH technical papers collection, a knowledge base that comprises over one hundred technical papers representing more than 20 years of advanced lithography research and development. The site is also used for product downloads.
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Computational Lithography Solution
PROLITH is a key product in KLA-Tencor’s portfolio of lithography optimization technologies. KLA-Tencor isthe world’s leading provider of comprehensive yield acceleration solutions, helping customers optimize lithography performance quickly and accurately. ProDATA works with PROLITH to deliver faster lithography optimization.
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